Address: B213, school of microelectronic, Fudan University, 220 Handan Road, Shanghai
Education & Work experience
2003 - 2006 PhD, Department of Microelectronics, Fudan University
2006 - 2007 Postdoctoral Fellow, Italy National Laboratory of Microelectronic Materials and Devices
2007 - 2009 Japan Society for the Promotion of Science (JSPS) Fellow, Department of Electrical Engineering, The University of Tokyo
2010 - 2014 Associate Professor, School of Microelectronics, Fudan University
2014 - Present Professor, School of Microelectronics, Fudan University
Hongliang Lu entered the School of Microelectronics, Fudan University in July 2010, and his main research direction is new semiconductor materials and devices for the next generation of Integrated Circuit (IC) technology. In the meantime, as the first person in charge, he takes a number of research programs, and has published 98 papers in domestic and international academic journals, including 70 papers indexed by SCI, and 55 papers indexed by EI. And he has applied for 21 domestic patents as well. At the same time, he examined and approved manuscripts for Nanoscale, Scientific Reports, Applied Physics Letters, Chemistry of Materials and other international journals. At present, he is IEEE Member, Secretary of China ALD Conference, Executive Director of Shanghai Vacuum Association and Member of Shanghai Institute of Electronics. He has been the recipient of Zhuoxue Program of Fudan University (2015), the Academic Leader of Youth Research and Innovation Program of Fudan University (2015), and the recipient of Youth Innovation Award of Shanghai Vacuum (2017).