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dvanced IC Process
Atomic Layer Deposition (ALD)
Atomic layer deposition (ALD) is a method in which substances can be deposited layer by layer on the surface of a substrate in the form of a monoatomic film. Atomic layer deposition is similar to ordinary chemical deposition. But in the process of atomic layer deposition, the chemical reaction of the new layer of atomic film is directly related to the previous layer.……
